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Molybdenum disulfide (MoS2) transistors are a promising alternative for the semiconductor industry due to their large on/off current ratio (>1010), immunity to short-channel effects, and unique switching characteristics. MoS2 has drawn considerable interest due to its intriguing electrical, optical, sensing, and catalytic properties. Monolayer MoS2 is a semiconducting material with a direct band gap of ~1.9 eV, which can be tuned. Commercially, the aim of synthesizing a novel material is to grow high-quality samples over a large area and at a low cost. Although chemical vapor deposition (CVD) growth techniques are associated with a low-cost pathway and large-area material growth, a drawback concerns meeting the high crystalline quality required for nanoelectronic and optoelectronic applications. This research presents a lower-temperature CVD for the repeatable synthesis of large-size mono- or few-layer MoS2 using the direct vapor phase sulfurization of MoO3. The samples grown on Si/SiO2 substrates demonstrate a uniform single-crystalline quality in Raman spectroscopy, photoluminescence (PL), scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and scanning transmission electron microscopy. These characterization techniques were targeted to confirm the uniform thickness, stoichiometry, and lattice spacing of the MoS2 layers. The MoS2 crystals were deposited over the entire surface of the sample substrate. With a detailed discussion of the CVD setup and an explanation of the process parameters that influence nucleation and growth, this work opens a new platform for the repeatable synthesis of highly crystalline mono- or few-layer MoS2 suitable for optoelectronic application. 

ABSTRACT The synthesis of two‐dimensional transition metal dichalcogenide (2D‐TMD) materials gives rise to inherent defects, specifically chalcogen vacancies, due to thermodynamic equilibrium. Techniques such as chemical vapor deposition (CVD), metal‐organic chemical vapor deposition (MOCVD), atomic layer deposition (ALD), flux growth method, and mechanical exfoliation produce large‐scale, uniform 2D TMD films, either in bulk or monolayers. However, defects on the film surface impact its quality, and it is necessary to measure defect density. The phonon confinement model indicates that the first‐order Raman band frequency shift depends on defect density. Monolayer Molybdenum disulfide (MoS₂) exhibits three phonon dispersions at the Brillouin zone edge (M point): out‐of‐plane optical phonon vibration (ZO), in‐plane longitudinal optical phonon vibration (LO), and in‐plane transverse optical phonon vibration (TO). The LO and ZO modes overlap with Raman in‐plane vibration (𝐸¹_2g) and Raman out‐of‐plane vibration (𝐴_1g), respectively, causing peak broadening. In the presence of defects, the Raman 𝐸¹_2gvibration energy decreases due to a reduced restoring force constant. The Raman 𝐴_1gvibration trend is random, influenced by both restoring force constant and mass. The study introduces a quantitative defect measurement technique for CVD‐grown monolayer MoS₂using Raman 𝐸¹_2gmode, employing sequential data processing algorithms to reveal defect density on the film surface.